| 摘要 |
In a semiconductor device fabricated by growing a compound semiconductor layer on a sapphire substrate, a sapphire substrate enabling the semiconductor device to have a high light-extraction efficiency is provided. A plurality of projections 2, 2, . . . are provided at random on a surface of a sapphire substrate 1, and a GaN layer 10 is grown on this surface. Then, a multi-quantum well layer 12, a p-AlGaN layer 14, a p-GaN layer 16, and an ITO layer 18 are formed on the GaN layer 10, and two electrodes 21 and 22 are also formed. In this manner, a semiconductor light-emitting device is fabricated. |
