| 摘要 |
<p>A method for processing a workpiece (10) having a photoresist layer (12) using an exposure device (30) is disclosed. A transparent sheet (20) which allows transmission of light emitted from the exposure device (30) is disposed between an object lens (35a) of the exposure device (30) and the photoresist layer (12), and the photoresist layer (12) is exposed to the light through the transparent sheet (20).</p> |
