| 摘要 |
<p>PURPOSE: A photo-sensitive resin composition for a black resist and a color filter light shielding film are provided to form patterns of the superior edge shape sharpness and developing margin and to stabilize the dimension of the patterns. CONSTITUTION: A photo-sensitive resin composition for a black resist includes a resin-phase polymer, a compound containing unsaturated group, a photo-polymerization initiator, and one or more light shielding components. The compound containing unsaturated group is obtained by reacting the resultant of an epoxy compound and (meta)acrylic acid with polybasic carboxylic acid or the anhydride of the same. The epoxy compound contains two glycidyl ether groups derived from bisphenols. The light shielding components are selected from a black organic pigment, a mixed color organic pigment, and a light shielding material. The resin-phase polymer is represented by chemical formula 1.</p> |
