| 摘要 |
Thermal evaporation apparatus for depositing of a material on a substrate, comprising material storage means; heating means to generate a vapor of the material in the material storage means; vapor outlet means comprising a vapor receiving pipe having vapor outlet passages, and emission reducing means arranged such that an external surface of the vapor outlet means directed to said substrate exhibits low emission, and wherein the apparatus further comprises pipe heating means in the interior of said vapor outlet means, wherein at least the surfaces of the material storage means, heating means, and emission reducing means and pipe heating means arranged to come into contact with the material vapor are of a corrosion-resistant material. Further a thermal evaporation apparatus for depositing a material on a substrate comprising a vapor outlet means arranged to receive in its interior the vapor of the material heated in a material storage means and having vapor outlet passages, wherein said vapor outlet means basically consist of a corrosion-resistant material and are gastight to such an extent that sufficient dynamic pressure of said material vapor is achievable for homogenous deposition of said material on said substrate. Also the use of the apparatus, and a method of depositing a material onto a substrate by thermal evaporation. |
