发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device includes a first wiring extending in a first direction and a second wiring extending in a second direction which crosses the first direction and being disposed with a space interposed between the first wiring and the second wiring, and including a tantalum layer, a tantalum nitride layer formed over the tantalum layer, and a metal layer formed over the tantalum nitride layer.
申请公布号 US8084794(B2) 申请公布日期 2011.12.27
申请号 US20090540952 申请日期 2009.08.13
申请人 KAMADA YOICHI;OKAMOTO NAOYA;FUJITSU LIMITED 发明人 KAMADA YOICHI;OKAMOTO NAOYA
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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