发明名称 |
Overlay mark, method of checking local aligmnent using the same and method of controlling overlay based on the same |
摘要 |
An overlay mark is described, including N sets of parallel x-directional linear patterns respectively defined by N (≧2) exposure steps and N sets of parallel y-directional linear patterns respectively defined by the N exposure steps, and a set of parallel x-directional photoresist bars and a set of parallel y-directional photoresist bars both formed in a lithography process. The N sets of x-directional linear patterns and the set of x-directional photoresist bars are arranged in parallel. The N sets of y-directional linear patterns and the set of y-directional photoresist bars are arranged in parallel. |
申请公布号 |
US8084872(B2) |
申请公布日期 |
2011.12.27 |
申请号 |
US20080166115 |
申请日期 |
2008.07.01 |
申请人 |
YANG CHIN-CHENG;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
YANG CHIN-CHENG |
分类号 |
G01B11/00;G06K9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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