PLASMA APPARATUS AND PLASMA MEASURING APPARATUS

摘要

PURPOSE: A plasma device and a plasma measuring device are provided to monitor a plasma state in real time to change a processing condition, thereby producing a substrate with good quality. CONSTITUTION: A plasma chamber(100) comprises a plasma space(400) for plasma processing. A suscepter(200) is located in the plasma chamber to support a substrate. A material spray unit sprays substrate processing materials into the plasma chamber. An electrode sensor(321) measures currents in the plasma space. A plasma measuring server(500) adjusts processing conditions in the plasma chamber by plasma variables.