| 摘要 |
PURPOSE: A liquid processing apparatus, a liquid processing method, and a storage medium are provided to certainly eliminate chemical liquid which flow into the main section and the upper surface of a processed substrate. CONSTITUTION: A substrate maintaining unit horizontally maintains a processed substrate. A rotation driving unit rotates the substrate maintaining unit around a vertical axis. A chemical liquid supply unit supplies chemical liquid onto the bottom of a rotating processed substrate. A rinse liquid supply unit supplies rinse liquid onto the bottom of a rotating processed substrate. An air current using unit uses fresh air from an external FFU(Fan Filter Unit).
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