| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>PURPOSE: A lithographic device and a device manufacturing method are provided to reduce the size of a gap on a substrate table or cover the gap, thereby reducing bubbles in immersion liquid. CONSTITUTION: A lithographic projecting device comprises a support table to maintain a substrate. A cover plate is placed on the support table. A gap is formed between the cover plate and the plate. The cover plate reduces the size of the gap. The reduces size of the gap is smaller than 0.1mm.</p> |
| 申请公布号 |
KR20110138198(A) |
申请公布日期 |
2011.12.26 |
| 申请号 |
KR20110115292 |
申请日期 |
2011.11.07 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;CORNELISSEN SEBASTIAAN MARIA JOHANNES;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;JACOBS HERNES;LEENDERS MARTINUS HENDRIKUS ANTONIUS;MERTENS JEROEN JOHANNES SOPHIA MARIA;STREEFKERK BOB;VAN DER TOORN JAN GERARD CORNELIS;SMITS PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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