| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an assembly used in a plasma process chamber that can obtain a stable substrate temperature, with high throughput and low temperature drift in the processes. <P>SOLUTION: A substrate support assembly 440 used in a plasma process chamber comprises: a support ring 430 corresponding to the component of the assembly; an edge ring 410 corresponding to a thermal source; and a polymer composite 420 therebetween. Temperature-induced phase change polymer that exhibits a temperature-induced phase transition between a high thermal conductivity phase and a low thermal conductivity phase can be used for the polymer composite 420 to maintain the temperature of the component at a high or low temperature during multi-step plasma etching processes. <P>COPYRIGHT: (C)2012,JPO&INPIT |
