DEPOSITION APPARATUS USING CHEMICAL BATH DEPOSITION

摘要

PURPOSE: A deposition device apparatus using a chemical solution growth method is provided to have a stirring unit which directly contacts a chemical solution, thereby increasing stirring performance of the chemical solution. CONSTITUTION: A chamber(110) stores a chemical solution for depositing a substrate. A chemical solution supply unit(150) supplies a chemical solution into the chamber. An elevation unit(130) repetitively elevates both ends of the chamber in opposite directions. The elevation unit includes a plurality of support members(140) and a plurality of driving units(131). The support members support the chamber at different heights. The driving units rotate a support member around a virtual axis between the support members.