METHOD FOR MANUFACTURING LIGHT TRAPPING TEXTURED SURFACE OF POLYSILICON SOLAR CELL

摘要

A method for manufacturing a light trapping textured surface of a polysilicon solar cell is provided. The method comprises the steps: forming macromolecule nanospheres by the method of solution self-assembly, combining the macromolecule nanospheres with the surface of a silicon wafer, forming a monodisperse layer of macromolecule nanospheres onto the surface of the silicon wafer, then performing the reactive ion etching (RIE) with the mask of the monodisperse layer and texturing the surface of the silicon wafer. By using the method, the reflectivity of the surface of the silicon wafer can be reduced to less than 2%, and the light absorption can be enhanced. Compared with the traditional technology for texturing the polysilicon solar cell by wet chemical etching, the method can achieve higher photoelectric conversion efficiency and can reduce the environmental pollution caused by texturing process and is suitable for the industrial production of the crystalline silicon solar cell.