发明名称 METHOD FABRICATING A PHASE-CHANGE SEMICONDUCTOR MEMORY DEVICE
摘要 A method of fabricating a phase-change semiconductor memory device includes a plasma treatment of an electrode connected to a phase-change material pattern after a conductive layer used to form the electrode has been planarized in the presence of an oxidizing agent. The plasma is formed from a plasma gas having a molecular weight of 17 or less.
申请公布号 US2011312126(A1) 申请公布日期 2011.12.22
申请号 US201113084647 申请日期 2011.04.12
申请人 BAE BYOUNG-JAE;CHOI BYOUNG-DEOG;PARK JEONG-HEE;KIM YOUNG-KUK;OH JIN-HO;SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE BYOUNG-JAE;CHOI BYOUNG-DEOG;PARK JEONG-HEE;KIM YOUNG-KUK;OH JIN-HO
分类号 H01L21/06;H01L21/02 主分类号 H01L21/06
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