| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist pattern forming method useful for fining a resist pattern and a pattern fining agent used for the method. <P>SOLUTION: There are provided a resist pattern forming method and a pattern fining agent, the resist pattern forming method comprising: a step (1) of forming a resist pattern using a chemically amplified positive resist composition on a support; a step (2) of applying the pattern fining agent to the resist pattern; a step (3) of baking the resist pattern to which the pattern fining agent has been applied; and a step (4) of subjecting the baked resist pattern to alkali development. The pattern fining agent contains an acid generator component and an organic solvent which dose not dissolve the resist pattern formed in the step(1). <P>COPYRIGHT: (C)2012,JPO&INPIT |
