发明名称 STATIC ELIMINATOR OF WAFER AND STATIC ELIMINATION METHOD OF WAFER
摘要 <P>PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface. <P>SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an ion supply part 14 disposed on a periphery of the cover 13 or below the periphery. An ion supply port 15 of the ion supply part 14 is arranged to face a space formed between the cover 13 and the prealigner 1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011258731(A) 申请公布日期 2011.12.22
申请号 JP20100131558 申请日期 2010.06.09
申请人 HITACHI HIGH-TECH CONTROL SYSTEMS CORP 发明人 SUGAI JUNJI;KOMATSU KENICHI;MATSUMURA YASUHIDE;KOBAYASHI TOMOKAZU
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
主权项
地址