发明名称 |
STATIC ELIMINATOR OF WAFER AND STATIC ELIMINATION METHOD OF WAFER |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface. <P>SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an ion supply part 14 disposed on a periphery of the cover 13 or below the periphery. An ion supply port 15 of the ion supply part 14 is arranged to face a space formed between the cover 13 and the prealigner 1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011258731(A) |
申请公布日期 |
2011.12.22 |
申请号 |
JP20100131558 |
申请日期 |
2010.06.09 |
申请人 |
HITACHI HIGH-TECH CONTROL SYSTEMS CORP |
发明人 |
SUGAI JUNJI;KOMATSU KENICHI;MATSUMURA YASUHIDE;KOBAYASHI TOMOKAZU |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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