发明名称 |
SEMICONDUCTOR DEVICE, CAMERA MODULE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of reducing the formation of gaps at a bonding interface between substrates. <P>SOLUTION: A semiconductor device comprises: a semiconductor substrate; an active layer formed on one surface of the semiconductor substrate; a wiring layer formed on the active layer and having wiring which forms protrusions on a surface that does not come into contact with the active layer; an insulating layer formed on the wiring layer such that a region excluding the portions above the wiring is formed as a recess; an embedded layer arranged on the recess of the insulating layer; a bonding layer arranged on the insulating layer and the embedded layer; and a substrate bonded to the bonding layer so as to face the surface of the semiconductor substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011258740(A) |
申请公布日期 |
2011.12.22 |
申请号 |
JP20100131803 |
申请日期 |
2010.06.09 |
申请人 |
TOSHIBA CORP |
发明人 |
TANIDA KAZUMA;YAMAGUCHI NAOKO;HONGO SATOSHI;NUMATA HIDEO |
分类号 |
H01L27/146;H01L21/02;H01L27/12;H01L27/14;H04N5/369 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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