| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel and useful quartz member used for a substrate processing apparatus relates to semiconductor manufacturing. <P>SOLUTION: A quartz member 101 is used for a substrate processing apparatus relates to semiconductor manufacturing. The quartz member 101 is provided with a recessed etching liquid holding part 102 that holds the etching liquid for detecting metal contaminants in the quartz member itself. <P>COPYRIGHT: (C)2012,JPO&INPIT |
