| 摘要 |
The present invention relates generally to the field of sequential surface chemistry. More specifically, it relates to products and methods for manufacturing products using Atomic Layer Deposition (“ALD”) to depose one or more materials onto a surface. ALD has the capability for high-quality defect free film deposition with few molecular layers. The present invention includes, in varying embodiments, methods of manufacturing electric components such as batteries, capacitors and electrochemical capacitors by ALD, and the products manufactured by those methods.
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