发明名称 |
PLASMA PROCESSING APPARATUS AND GAS SUPPLY MEMBER SUPPORT DEVICE |
摘要 |
There is provided a plasma processing apparatus capable of performing a plasma process while surely supplying a gas. The plasma processing apparatus includes an outer gas supply member having gas supply openings for supplying a plasma processing gas and a jacket configured to support the outer gas supply member within a processing chamber and serving as a gas supply member supporting device. The jacket includes three supporting members installed so as to connect the outer gas supply member and a sidewall and arranged at a certain distance in a direction in which the outer gas supply member extends and mounts fixed to the sidewall so as to mount the supporting members therein. The supporting members include a first supporting member fixed to a first mount and a second supporting member movably supported in a second mount.
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申请公布号 |
US2011308733(A1) |
申请公布日期 |
2011.12.22 |
申请号 |
US201113115289 |
申请日期 |
2011.05.25 |
申请人 |
MIHARA NAOKI;SUDOU KENJI;MURAKAMI KAZUO;FURUKAWA SATOSHI;TOKYO ELECTRON LIMITED |
发明人 |
MIHARA NAOKI;SUDOU KENJI;MURAKAMI KAZUO;FURUKAWA SATOSHI |
分类号 |
C23F1/08;H05H1/24 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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