发明名称 |
SCHOTTKY DIODE STRUCTURE AND METHOD FOR FABRICATING THE SAME |
摘要 |
A Schottky diode structure and a method for fabricating the same, which are based on the principle of charge compensation, wherein a P-type gallium nitride layer is added to a Schottky diode structure, and wherein the PN junction of the P-type gallium nitride layer and the N-type gallium nitride layer decreases the non-uniformity of the surface electric field distribution, whereby the breakdown voltage of the element is raised. |
申请公布号 |
US2011309371(A1) |
申请公布日期 |
2011.12.22 |
申请号 |
US20100816765 |
申请日期 |
2010.06.16 |
申请人 |
HSU SHUO-HUNG;LIAN YI-WEI;LIN YU-SYUAN |
发明人 |
HSU SHUO-HUNG;LIAN YI-WEI;LIN YU-SYUAN |
分类号 |
H01L29/872;H01L21/329;H01L29/20 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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