发明名称 SCHOTTKY DIODE STRUCTURE AND METHOD FOR FABRICATING THE SAME
摘要 A Schottky diode structure and a method for fabricating the same, which are based on the principle of charge compensation, wherein a P-type gallium nitride layer is added to a Schottky diode structure, and wherein the PN junction of the P-type gallium nitride layer and the N-type gallium nitride layer decreases the non-uniformity of the surface electric field distribution, whereby the breakdown voltage of the element is raised.
申请公布号 US2011309371(A1) 申请公布日期 2011.12.22
申请号 US20100816765 申请日期 2010.06.16
申请人 HSU SHUO-HUNG;LIAN YI-WEI;LIN YU-SYUAN 发明人 HSU SHUO-HUNG;LIAN YI-WEI;LIN YU-SYUAN
分类号 H01L29/872;H01L21/329;H01L29/20 主分类号 H01L29/872
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