| 摘要 |
<p>#CMT# #/CMT# The module has a supplying device for supplying molecular hydrogen (2), and a tungsten coil (3) for producing atomic hydrogen. A heating element (4) heats the atomic and molecular hydrogen at a temperature below dissociation temperature of the atomic and molecular hydrogen. The heating element comprises a larger surface than that of the coil and is switched independent of the coil, where the heating element and the coil are connected with same ground line. A control unit controls voltage at the heating element and the coil, where the heating element is made of tungsten. #CMT#USE : #/CMT# Cleaning module for cleaning a component i.e. multi-layer mirror, of an extreme UV (EUV) projection exposure system of a semiconductor lithography plant (all claimed) that is utilized for creating microscopic structures on a semiconductor substrate of an integrated switching circuit in an electronic component. #CMT#ADVANTAGE : #/CMT# The heating element heats the atomic and molecular hydrogen at the temperature below the dissociation temperature of the atomic and molecular hydrogen, so that the hydrogen is utilized for cleaning application, heating application and for maintaining the module at a moderate temperature, thus extending functionality of the module apart from cleaning the component of a EUV projection exposure system. The heating element comprises larger surface than that of the tungsten coil, thus enabling efficient heating of the hydrogen at low temperature. The heating element and the tungsten coil are connected with the same ground line, thus reducing wiring cost of the module. The heating element is made of tungsten, so that the heating element has high thermal robustness. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic sectional view of a projection exposure system with a mirror. '(Drawing includes non-English language text)' 1 : Multi-layer mirror 2 : Molecular hydrogen 3 : Tungsten coil 4 : Heating element.</p> |
