| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that a laser dark field type substrate inspection device has variation in reflection intensity due to in-film multiple interference during inspection of a substrate having an oxide film (transparent film) formed on a surface because of high coherence of illumination light, and also decreases in sensitivity of defect detection due to larger background light noise caused by interference of scattered light depending upon surface roughness (roughness, grains, etc.) of a metal film during inspection of a substrate having the metal film formed on a surface. <P>SOLUTION: Low-interference, high-luminance illumination is employed which uses a broadband light source (super continuum light source, etc.) with good directivity. Further, a conventional laser light source is also used in combination, and the light sources are distinctively used to achieve high-sensitivity inspection in accordance with a state of a wafer. Furthermore, an illumination optical system provided with an adjusting mechanism is used as illumination optical systems of both the light sources in common to actualize the effect on a simple optical system. <P>COPYRIGHT: (C)2012,JPO&INPIT |
