发明名称 |
METHOD OF PRODUCING PATTERNED BODY, METHOD OF MANUFACTURING FUNCTIONAL ELEMENT AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an efficient method of producing a patterned body capable of high definition patterning. <P>SOLUTION: The method of producing a patterned body comprises: a photoresist patterning step of forming a photoresist pattern on a hydrophobic layer having a surface exhibiting hydrophobicity; a hydrophilization step of forming a hydrophilic region by irradiating the surface of the hydrophobic layer on which the photoresist pattern is formed with energy thereby hydrophilizing the surface; and a photoresist pattern peeling step of peeling the photoresist pattern and forming, on the surface of the hydrophobic layer, a hydrophilic/hydrophobic pattern where the hydrophilic region and a hydrophobic region covered with the photoresist pattern in hydrophilization step are formed in pattern shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011259001(A) |
申请公布日期 |
2011.12.22 |
申请号 |
JP20110220411 |
申请日期 |
2011.10.04 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
OGAWA KENICHI;SUZUKI TOMOMI;KANO MASATAKA |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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