发明名称 METHOD OF PRODUCING PATTERNED BODY, METHOD OF MANUFACTURING FUNCTIONAL ELEMENT AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an efficient method of producing a patterned body capable of high definition patterning. <P>SOLUTION: The method of producing a patterned body comprises: a photoresist patterning step of forming a photoresist pattern on a hydrophobic layer having a surface exhibiting hydrophobicity; a hydrophilization step of forming a hydrophilic region by irradiating the surface of the hydrophobic layer on which the photoresist pattern is formed with energy thereby hydrophilizing the surface; and a photoresist pattern peeling step of peeling the photoresist pattern and forming, on the surface of the hydrophobic layer, a hydrophilic/hydrophobic pattern where the hydrophilic region and a hydrophobic region covered with the photoresist pattern in hydrophilization step are formed in pattern shape. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011259001(A) 申请公布日期 2011.12.22
申请号 JP20110220411 申请日期 2011.10.04
申请人 DAINIPPON PRINTING CO LTD 发明人 OGAWA KENICHI;SUZUKI TOMOMI;KANO MASATAKA
分类号 H01L21/027 主分类号 H01L21/027
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