发明名称 OPTICAL ENERGY-CROSSLINKABLE INSULATING LAYER MATERIAL FOR ORGANIC THIN FILM TRANSISTOR, OVERCOAT INSULATING LAYER, AND ORGANIC THIN FILM TRANSISTOR
摘要 <p>Disclosed is an insulating layer material for an organic thin film transistor, which enables the production of an organic thin film transistor that has a threshold voltage with a small absolute value. Specifically disclosed is an insulating layer material for an organic thin film transistor, which contains a polymer compound (A) that has a repeating unit containing a fluorine atom and another repeating unit containing a functional group that absorbs optical energy or electron beam energy and causes a dimerization reaction.</p>
申请公布号 WO2011158929(A1) 申请公布日期 2011.12.22
申请号 WO2011JP63895 申请日期 2011.06.17
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;YAHAGI, ISAO 发明人 YAHAGI, ISAO
分类号 H01L29/786;C08F214/18;C08F216/00;H01L21/312;H01L21/768;H01L23/522;H01L51/05;H01L51/30 主分类号 H01L29/786
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