| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for depositing a film, which can suppress the change of a refractive index with the elapse of time when an MgF<SB POS="POST">2</SB>thin film is deposited by a sputtering method. <P>SOLUTION: The method for depositing the film includes: a first film deposition step of protruding at least one part of the MgF<SB POS="POST">2</SB>in a molecule state and depositing a film using the MgF<SB POS="POST">2</SB>in the molecule state on a substrate 102 by sputtering the MgF<SB POS="POST">2</SB>131 with the surface temperature maintaining between 650°C and 1,100°C while introducing gas containing at least one of oxygen and nitrogen; and a second film deposition step of depositing a metal oxide on the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
