发明名称 SPUTTERING FILM FORMING DEVICE, AND ADHESION PREVENTING MEMBER
摘要 <p>Provided are an adhesion preventing member from which a thin film deposited during the film forming process does not detach, and a sputtering film forming device having the adhesion preventing member. Adhesion preventing members (251-254, 35) are made from Al2O3, the arithmetic mean roughness of the adhesion surface of the film forming particles is 4µm - 10µm, and the deposited film is difficult to detach. In the sputtering film forming device, the adhesion preventing members (251-254, 35) are disposed in positions surrounding the peripheries of sputtering surfaces (231-234) of targets (211-214), and a position surrounding the periphery of the film formation surface of a substrate (31).</p>
申请公布号 WO2011158828(A1) 申请公布日期 2011.12.22
申请号 WO2011JP63583 申请日期 2011.06.14
申请人 ULVAC, INC.;OHNO, TETSUHIRO;SATO, SHIGEMITSU;ISOBE, TATSUNORI;SUDA, TOMOKAZU 发明人 OHNO, TETSUHIRO;SATO, SHIGEMITSU;ISOBE, TATSUNORI;SUDA, TOMOKAZU
分类号 C23C14/00;H01L21/31 主分类号 C23C14/00
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