发明名称 FLUORIDE RESIDUE RECOVERY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a fluoride residue recovery device which is capable of preventing a fluorine gas and a radioactive substance from leaking to the outside of a fluorine atmosphere system and of preventing production of HF and material corrosion due to the HF by mixing moisture into the fluorine atmosphere system to react the moisture with an F<SB POS="POST">2</SB>gas. <P>SOLUTION: First and second fluoride residue recovery containers 7A and 7B are serially connected on the downstream side of a flame reactor 4. When an amount of fluoride residue deposited on a bottom of the flame reactor reaches a predetermined amount, a control device 10 opens a first gate valve 8A to transfer the fluoride residue deposited on the bottom of the flame reactor to the first fluoride residue recovery container 7A. After this transfer of the residue, the control device 10 closes the first gate valve 8A and opens a second gate valve 8B to transfer the fluoride residue in the first fluoride residue recovery container 7A to the second fluoride residue recovery container 7B. After this transfer of the residue, the control device 10 closes the second gate valve 8B and opens a third gate valve 8C to transfer the fluoride residue in the second fluoride residue recovery container 7B to an oxide conversion step. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011257230(A) 申请公布日期 2011.12.22
申请号 JP20100131058 申请日期 2010.06.08
申请人 HITACHI-GE NUCLEAR ENERGY LTD 发明人 HOSHINO KUNIYOSHI;OIKAWA HIDENORI;HANAWA TAKAO
分类号 G21C19/44 主分类号 G21C19/44
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