| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion beam scan processing method with which beam radiation efficiency is improved and in-plane uniformity of dosage can be maintained. <P>SOLUTION: In beam tuning, scan (X) direction distribution characteristics of a beam current at a maximum beam scan width (BSW1) are measured, and a scan voltage correction function 15w at such a time is calculated. On the basis of the calculated characteristics, a plurality of scan voltage correction functions 15w corresponding to scheduled beam scan widths (BSW1-BSW3 or the like) are automatically computed while satisfying lateral (X) direction dosage uniformity. Continuously, a beam scan area at one side of a wafer is D-shaped by switching the scan voltage correction function in accordance with a mechanical Y scan position, thereby reducing beam scan areas. Another side is a fixed scan area, a beam current of a side cup (76 at a P1 side) of this side is measured and a mechanical Y scan speed is varied in accordance with the measurement, thereby ensuring longitudinal (Y) direction dosage uniformity. <P>COPYRIGHT: (C)2012,JPO&INPIT |
