| 摘要 |
<P>PROBLEM TO BE SOLVED: To transfer a uniform texture structure to a workpiece. <P>SOLUTION: Resist 20 is formed in mesh on the surface of a single crystal silicon substrate 10 having a plane direction (001) by photolithography so that squares arranged in matrix are exposed (step S3, S4). The single crystal silicon substrate 10 is then etched (step S5), the resist 20 is peeled using a solvent (step S6), and a diamond is deposited on the surface of the single crystal silicon substrate 10 (step S7). Thereafter, the single crystal silicon substrate 10 is removed from the single crystal silicon substrate 10 on which diamond 40 is deposited using fluoro-nitric acid (step S8). Finally, platinum is deposited on the surface of the diamond 40 by sputtering thus completing a mold. <P>COPYRIGHT: (C)2012,JPO&INPIT |
