发明名称 |
METHOD FOR MANUFACTURING PATTERNED ELECTRON SOURCE, AND PATTERNED ELECTRON SOURCE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a patterned electron source, by which a fine pattern can be easily formed, and a patterned electron source. <P>SOLUTION: The method for manufacturing a patterned electron source includes the steps of: forming a first field emission part 1 by forming a first pattern 5 on a first substrate 2 having a conductive surface and then providing one or more first emitters 10 along the first pattern 5; and forming a second field emission part 15 by irradiating an electron beam from the first emitters 10 to form a second pattern 18 on a second substrate 16 having a conductive surface and then providing one or more second emitters along the second pattern 18. A patterned electron source 25 is manufactured by forming a plurality of the second field emission parts 15. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011258502(A) |
申请公布日期 |
2011.12.22 |
申请号 |
JP20100133888 |
申请日期 |
2010.06.11 |
申请人 |
UNIV OF TOKYO |
发明人 |
NODA SUGURU;SHIRATORI YOSUKE |
分类号 |
H01J9/02;H01J29/04;H01L21/027 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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