发明名称 METHOD FOR MANUFACTURING PATTERNED ELECTRON SOURCE, AND PATTERNED ELECTRON SOURCE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a patterned electron source, by which a fine pattern can be easily formed, and a patterned electron source. <P>SOLUTION: The method for manufacturing a patterned electron source includes the steps of: forming a first field emission part 1 by forming a first pattern 5 on a first substrate 2 having a conductive surface and then providing one or more first emitters 10 along the first pattern 5; and forming a second field emission part 15 by irradiating an electron beam from the first emitters 10 to form a second pattern 18 on a second substrate 16 having a conductive surface and then providing one or more second emitters along the second pattern 18. A patterned electron source 25 is manufactured by forming a plurality of the second field emission parts 15. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011258502(A) 申请公布日期 2011.12.22
申请号 JP20100133888 申请日期 2010.06.11
申请人 UNIV OF TOKYO 发明人 NODA SUGURU;SHIRATORI YOSUKE
分类号 H01J9/02;H01J29/04;H01L21/027 主分类号 H01J9/02
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