发明名称 PROCESS FOR MANUFACTURING POWER INTEGRATED DEVICES HAVING SURFACE CORRUGATIONS, AND POWER INTEGRATED DEVICE HAVING SURFACE CORRUGATIONS
摘要 According to a process for manufacturing an integrated power device, projections and depressions are formed in a semiconductor body that extend in a first direction and are arranged alternated in succession in a second direction, transversely to the first direction. Further provided are a first conduction region and a second conduction region. The first conduction region and the second conduction region define a current flow direction parallel to the first direction, along the projections and the depressions. To form the projections and the depressions, portions of the semiconductor body that extend in the first direction and correspond to the depressions, are selectively oxidized.
申请公布号 US2011309480(A1) 申请公布日期 2011.12.22
申请号 US201113162951 申请日期 2011.06.17
申请人 MARIANI SIMONE DARIO;PALEARI ANDREA;BACH STEPHANE WEN YUNG;GATTARI PAOLO;STMICROELECTRONICS S.R.I. 发明人 MARIANI SIMONE DARIO;PALEARI ANDREA;BACH STEPHANE WEN YUNG;GATTARI PAOLO
分类号 H01L29/06;H01L21/31 主分类号 H01L29/06
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