发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A semiconductor device includes a semiconductor integrated circuit device (1). In the semiconductor integrated circuit device (1), a semiconductor integrated circuit (5) is formed on a center of the surface of a semiconductor substrate (3), and a plurality of electrode terminals (71, 73, . . . ) are provided on the surface of the semiconductor substrate (3). A protection film (9) is provided on the surface of the semiconductor substrate (3) such that the surfaces of the electrode terminals (71, 73) are exposed. The electrode terminals (71, 73, . . . ) include an electrode terminal (73) having a thin portion (74). The surface of the thin portion (74) is located below the surfaces of the electrode terminals except for the electrode terminal (73) having the thin portion (74) among the electrode terminals (71, 73, . . . ).
申请公布号 US2011309505(A1) 申请公布日期 2011.12.22
申请号 US201113221037 申请日期 2011.08.30
申请人 TAKEMURA KOUJI;PANASONIC CORPORATION 发明人 TAKEMURA KOUJI
分类号 H01L23/498;H01L21/66 主分类号 H01L23/498
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