RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND

摘要

Disclosed are: a resist composition and a resist pattern formation method, both of which enable the formation of a fine resist pattern having good lithographic properties; a novel polymeric compound which is useful for the resist composition; and a compound which is useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound (A) which has a constituent unit (a0) represented by general formula (a0). In the formula (a0), A represents an anion represented by general formula (1) or (2).