发明名称 EXPOSURE APPARATUS
摘要 <p>A mask stage (10) is provided with: a mask stage base (11); four mask holders (71, 72) with the ability to adhere to and hold each edge of a mask (M); linear guides (73) disposed between a pair of mask holders (72) that adhere to and hold the side of the mask stage base (11) and the short sides of the mask (M); a drive mechanism (74) that forces the mask holders (72) to move on the short side; and a tilt angle adjustment mechanism (80) that is disposed between the side of the mask stage base (11) and the sides of the mask holders (72), and has the ability to adjust the tilt angle of the mask (M). This configuration enables a plurality of masks of different sizes to be accommodated in a state in which flatness is kept constant.</p>
申请公布号 WO2011158760(A1) 申请公布日期 2011.12.22
申请号 WO2011JP63407 申请日期 2011.06.10
申请人 NSK TECHNOLOGY CO., LTD.;HAYASHI SHINICHIRO;KIRIU YASUTAKA;TOGAWA SATORU;MATSUZAKA MASAAKI 发明人 HAYASHI SHINICHIRO;KIRIU YASUTAKA;TOGAWA SATORU;MATSUZAKA MASAAKI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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