| 摘要 |
The invention concerns about an apparatus and method for depositing a protective layer. The apparatus includes an anti-hydration module, wherein a substrate is loaded through a substrate input hole and mounted on a carrier; a load lock chamber, which is connected to the anti-hydration module and maintains a vacuum; a plurality of vacuum chambers; a depositing chamber, which is installed in one of the vacuum chambers; a target unit, which is installed in the depositing chamber and deposits a raw material of a protective layer on the substrate; a transferring unit which is continuously installed in the anti-hydration module, the load lock chamber, the vacuum chambers, and the depositing chamber, and transfers the substrate mounted on the carrier. Accordingly, since the carrier is not exposed to the atmosphere, moisture pressure inside the depositing chamber does not increase even if the apparatus is used for a long time. |
