| 发明名称 |
HYDROGEN RADICAL GENERATOR |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for reducing contaminant generated by a hydrogen radical generator and deposited on a lighting element of a lithographic apparatus. <P>SOLUTION: The method according to the present embodiment includes allowing hydrogen molecules to pass through a first portion of a metal filament when temperature of a first part of a metallic oxide of the metal filament of the hydrogen radical generator is reduction temperature that is equal to or less than evaporation temperature of the metallic oxide. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2011258950(A) |
申请公布日期 |
2011.12.22 |
| 申请号 |
JP20110124720 |
申请日期 |
2011.06.03 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
SHUSVOORT GERALD FRANZ JOSEPH;PHIBLESSE JEROEN MARCEL;VANEL ROELANT NICOLAS MARIA;ARNOLDUS JAN STORM;EDWIN TE SLIGTE;KEMPEN ANTONIUS THEODORS WILHELMS;YONKEL WATER AND LEES;PFIZER TIMO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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