发明名称 |
Exposure mask and method for manufacturing semiconductor device using the same |
摘要 |
A method for manufacturing a semiconductor device comprises performing an exposing and developing process using an exposure mask including shading patterns and assistant patterns arranged in parallel to the shading patterns to prevent a scum phenomenon generated when a main pattern is formed in a cell region over a semiconductor substrate, thereby improving characteristics, reliability and yield of the semiconductor device. As a result, the method enables high-integration of the semiconductor device. |
申请公布号 |
US8080349(B2) |
申请公布日期 |
2011.12.20 |
申请号 |
US20090495537 |
申请日期 |
2009.06.30 |
申请人 |
SONG JOO KYOUNG;YUNE HYOUNG SOON;HYNIX SEMICONDUCTOR, INC. |
发明人 |
SONG JOO KYOUNG;YUNE HYOUNG SOON |
分类号 |
G03F1/00;G03F7/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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