发明名称 |
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
摘要 |
A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis. |
申请公布号 |
US8079894(B2) |
申请公布日期 |
2011.12.20 |
申请号 |
US20090581049 |
申请日期 |
2009.10.16 |
申请人 |
TOLLES ROBERT D.;SHENDON NORMAN;SOMEKH SASSON;PERLOV ILYA;GANTVARG EUGENE;LEE HARRY Q.;APPLIED MATERIALS, INC. |
发明人 |
TOLLES ROBERT D.;SHENDON NORMAN;SOMEKH SASSON;PERLOV ILYA;GANTVARG EUGENE;LEE HARRY Q. |
分类号 |
B24B7/22;B24B27/00;B24B37/04;B24B41/00;B24B41/06;B24B53/007;B24B53/12;B24B57/02;H01L21/00;H01L21/306 |
主分类号 |
B24B7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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