发明名称 Semiconductor device having a ferroelectric capacitor and method of manufacturing the same
摘要 A semiconductor device includes a semiconductor substrate, a plurality of transistors connected in series and including a transistor having first and second diffusion regions arranged in the semiconductor substrate. The device also includes an insulating film columnar body arranged above the semiconductor substrate, and having a side which is inclined to a top surface of the substrate by an inclination angle greater than 0 degrees and less than 90 degrees. The device includes a memory cell including a first electrode arranged on the side of the insulating film columnar body and connected to the first diffusion region via a first contact plug, a ferroelectric film arranged on the first electrode, and a second electrode arranged on the ferroelectric film, and connected to the second diffusion region via a second contact plug.
申请公布号 US8080841(B2) 申请公布日期 2011.12.20
申请号 US20090553763 申请日期 2009.09.03
申请人 KANAYA HIROYUKI;KABUSHIKI KAISHA TOSHIBA 发明人 KANAYA HIROYUKI
分类号 H01L29/76 主分类号 H01L29/76
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