发明名称 LINEAR VAPORIZING DEPOSITION APPARATUS USING PLASMA
摘要 PURPOSE: A linear evaporation and deposition apparatus using plasma is provided to uniformly deposit organic materials on a substrate by injecting the linearly evaporated organic materials to the substrate. CONSTITUTION: A linear evaporation and deposition apparatus using plasma comprises a plasma generator(200), an evaporation unit(300), an injection unit, and a media gas supply unit. The plasma generator generates plasma discharged by a plasma source. The evaporation unit heats organic materials using the generated plasma and evaporates the organic materials. The injection unit injects the evaporated organic materials to a substrate. The medium gas supply unit supplies medium gas to the evaporation unit and discharges the organic materials evaporated in the evaporation unit to the injection unit.
申请公布号 KR20110135783(A) 申请公布日期 2011.12.19
申请号 KR20100055705 申请日期 2010.06.11
申请人 NP HOLDINGS CO., LTD. 发明人 CHOI, DAI KYU
分类号 C23C14/24 主分类号 C23C14/24
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