发明名称 |
HOMOEPITAXIAL III-V NITRIDE ARTICLE, DEVICE, AND METHOD OF FORMING III-V NITRIDE HOMOEPITAXIAL LAYER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a III-V nitride article that is useful for a device, such as LED and a high electron mobility transistor. <P>SOLUTION: There is provided a homoepitaxial III-V nitride article including a III-V nitride homoepitaxial layer which deposits on a free-standing III-V nitride substrate. The III-V nitride homoepitaxial layer has dislocation density of less than 1E6 /cm<SP POS="POST">2</SP>and has characteristics selected from: (i) having oxide between the III-V nitride homoepitaxial layer and the free-standing III-V nitride substrate; (ii) having an epi interlayer between the III-V nitride homoepitaxial layer and the free-standing III-V nitride substrate; and (iii) having offcuts of the free-standing III-V nitride substrate and having non (0001) homoepitaxial step flow crystal growth in the III-V nitride homoepitaxial layer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011251905(A) |
申请公布日期 |
2011.12.15 |
申请号 |
JP20110183170 |
申请日期 |
2011.08.24 |
申请人 |
CREE INC |
发明人 |
FLYNN JEFFREY S;BRANDES GEORGE R;VAUDO ROBERT P;KEOGH DAVID M;XU XUEPING;LANDINI BARBARA E |
分类号 |
C30B29/38;C23C16/34;C23C16/44;C30B23/00;C30B25/00;C30B25/02;C30B25/18;C30B25/20;C30B33/00;H01L21/20;H01L21/203;H01L21/205;H01L21/338;H01L29/778;H01L29/812;H01L33/32;H01S5/323 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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