THIN FILM DEPOSITION DEVICE AND THIN FILM DEPOSITION SYSTEM

摘要

Disclosed is a thin film deposition device that minimizes the process wait time of the arrangement/alignment time of a substrate and a deposition mask. To this end, the thin film deposition device includes: a chamber having a reaction space; a first substrate holder and a second substrate holder disposed with a space therebetween in the chamber to receive a substrate; a deposition source disposed between the first substrate holder and the second substrate holder to supply deposition materials to the first substrate holder and the second substrate holder; and a fixing unit placing the first substrate holder and the second substrate holder at a specific position in the chamber while the substrate is received at the first substrate holder and the second substrate holder. Accordingly, the stable alignment of a substrate and a mask may be achieved.