发明名称 |
PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED FORM SAME, AND ELEMENT HAVING CURED FILM |
摘要 |
<p>Disclosed is a photosensitive siloxane composition having: (a) a polysiloxane synthesized by reacting at least one organosilane represented by general formula 1, (b) a quinone diazide compound, (c) a solvent, and (d) the silicate compound represented by general formula 2. (In formula 1, R1 represents any of hydrogen, an alkyl group having 1-10 carbon atoms, an alkenyl group having 2-10 carbon atoms, or an aryl group having 6-15 carbon atoms; the plurality of R1 may be the same or different. R2 represents any of hydrogen, an alkyl group having 1-6 carbon atoms, an acyl group having 2-6 carbon atoms, or an aryl group having 6-15 carbon atoms; the plurality of R2 may be the same or different; and n represents an integer from 0 to 3.) (In formula 2, R3 to R6 each independently represents any of hydrogen, an alkyl group having 1-6 carbon atoms, an acyl group having 2-6 carbon atoms; or an aryl group having 6-15 carbon atoms; and p represents an integer from 2 to 10.) Provided is the photosensitive siloxane composition that can yield a cured film having the properties of high heat resistance and high transparency, and of which the chemical resistance is favorable.</p> |
申请公布号 |
WO2011155382(A1) |
申请公布日期 |
2011.12.15 |
申请号 |
WO2011JP62684 |
申请日期 |
2011.06.02 |
申请人 |
TORAY INDUSTRIES, INC.;SENOO, MASAHIDE;FUJIWARA, TAKENORI;FUKUHARA, SHO;SUWA, MITSUHITO;YAMAMOTO, EIGO;UCHIDA, KEIICHI |
发明人 |
SENOO, MASAHIDE;FUJIWARA, TAKENORI;FUKUHARA, SHO;SUWA, MITSUHITO;YAMAMOTO, EIGO;UCHIDA, KEIICHI |
分类号 |
G03F7/075;C08K3/28;C08L83/00;G02F1/1333;G02F1/1368;G03F7/004;G03F7/023 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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