| 发明名称 |
TRAY FOR DRY ETCHING, DRY ETCHING METHOD USING THE SAME, METHOD OF MANUFACTURING TRAY, AND METHOD OF MANUFACTURING MOLD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a mold used for a nano imprint technique with high accuracy, a tray for dry etching capable of conveniently manufacturing the mold, a method of manufacturing the same, and a dry etching method using the tray. <P>SOLUTION: This tray 1 for dry etching includes: a base body 2; a recessed part 3 for fitting an etching object located on one surface 2a of the base body; an opening area ratio adjustment surface 4 being the surface 2a around the recessed part 3; and an opening area ratio adjustment layer 5 covering the opening area ratio adjustment surface 4 in a range of 0-100%. One of the base body 2 and the opening area ratio adjustment layer 5 is made of a material capable of being dry-etched, and the other of them is made of a material incapable of being dry-etched. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2011251509(A) |
申请公布日期 |
2011.12.15 |
| 申请号 |
JP20100128634 |
申请日期 |
2010.06.04 |
| 申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
CHIBA TAKESHI |
| 分类号 |
B29C33/38;H01L21/027;H01L21/3065;H01L21/683 |
主分类号 |
B29C33/38 |
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