| 摘要 |
<p>Disclosed is a method by which an aluminum oxide-containing silicon oxide film having excellent moisture resistance can be directly formed on a high-temperature glass substrate or glass ribbon, thereby efficiently producing a glass substrate with an aluminum oxide-containing silicon oxide film, said glass substrate having low refractive index and high light transmittance. Specifically, (1) an aluminum oxide-containing silicon oxide film is formed on a glass substrate by applying a coating liquid, which contains an organopolysiloxane and an organic aluminum complex, to the glass substrate that is within the temperature range of 400-650°C, or (2) in a method for producing a glass substrate by forming molten glass into a glass ribbon and slowly cooling and then cutting the glass ribbon, an aluminum oxide-containing silicon oxide film is formed on the glass ribbon by applying a coating liquid, which contains an organopolysiloxane and an organic aluminum complex, to the glass ribbon at a position where the glass ribbon is within the temperature range of 400-650°C.</p> |
