发明名称 |
MEASUREMENT MEMBER, STAGE DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
<p>Disclosed is a measurement member which is used for an exposure apparatus wherein a substrate is exposed to exposure light through a liquid. The measurement member comprises: a base that is capable of transmitting the exposure light; a conductive light-blocking film that is formed on the base and defines an opening into which the exposure light can enter through the liquid; and a conductive member that is connected to at least a part of the light-blocking film for the purpose of grounding the light-blocking film.</p> |
申请公布号 |
WO2011155529(A1) |
申请公布日期 |
2011.12.15 |
申请号 |
WO2011JP63139 |
申请日期 |
2011.06.08 |
申请人 |
NIKON CORPORATION;SHIRAISHI NAOMASA |
发明人 |
SHIRAISHI NAOMASA |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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