发明名称 MEASUREMENT MEMBER, STAGE DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>Disclosed is a measurement member which is used for an exposure apparatus wherein a substrate is exposed to exposure light through a liquid. The measurement member comprises: a base that is capable of transmitting the exposure light; a conductive light-blocking film that is formed on the base and defines an opening into which the exposure light can enter through the liquid; and a conductive member that is connected to at least a part of the light-blocking film for the purpose of grounding the light-blocking film.</p>
申请公布号 WO2011155529(A1) 申请公布日期 2011.12.15
申请号 WO2011JP63139 申请日期 2011.06.08
申请人 NIKON CORPORATION;SHIRAISHI NAOMASA 发明人 SHIRAISHI NAOMASA
分类号 H01L21/027 主分类号 H01L21/027
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