发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE: A method for manufacturing a semiconductor substrate is provided to reduce the generation of a bending phenomenon by separating the semiconductor substrate which grown in the side of a non-growth substrate using laser. CONSTITUTION: Semiconductor substrates(22a,22b) are grown up in both side of a non-growth substrate(21). A side of the non-growth substrate is processed. Laser is irradiated to the side of the non-growth substrate. The semiconductor substrate which is grown up in the non-growth substrate and both sides of the non-growth substrate is separated. The non-growth substrate is selected between a sapphire substrate or an aluminum nitride substrate. The laser is one of yag laser and excimer laser.
申请公布号 KR101094404(B1) 申请公布日期 2011.12.15
申请号 KR20100103583 申请日期 2010.10.22
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 JEON, JONG PIL;KONG, SUN HWAN;LOGVINOV SERGEY;PARK, HYUN JONG;LEE, WON JO;BAE, JUNG YOUNG;PARK, CHEOL MIN;CHOI, JUN SUNG;LEE, DONG WOOK
分类号 H01L21/20 主分类号 H01L21/20
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