| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can perform a wafer level measurement without lowering productivity. <P>SOLUTION: In a single or multiple stage lithographic apparatus, a table provides a confining surface to a liquid supply system, for example, during substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of a projection beam, for example, during substrate table exchange and/or substrate loading and unloading. <P>COPYRIGHT: (C)2012,JPO&INPIT |
