| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mist withdrawing mechanism for a substrate liquid processing device for which space saving in a vertical direction can be implemented. <P>SOLUTION: A mist withdrawing mechanism includes a liquid guide upper cup provided at the upper side of a peripheral edge area of a mist guide cup, a liquid guide center cup which is provided to be vertically movable from the lower side to the upper side of the peripheral edge area of the mist guide cup, and a liquid guide lower cup which is provided to be vertically movable from the lower side to the upper side of the peripheral edge area of the mist guide cup. The positions of the respective cups in the vertical direction are controlled so that three withdrawing states can be selected. Liquid withdrawn under each withdrawing state is guided to each of first to third drain tanks. The first to third drain tanks are arranged so as to be aligned with one another in a radial direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
