| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method capable of stably performing high-definition imprint transfer, and a substrate for imprint for implementing such an imprint method. <P>SOLUTION: This substrate for imprint is formed into a substrate 1 for imprint including a substrate body 2 and a wettability change layer 3 located on a one-side surface of the substrate body 2, or a substrate 11 for imprint including a substrate body 12 and a surrounding structure 13 located on a one-side surface of the substrate body 12, and thereby the height of a droplet of a resin 51 supplied as a processing object to the substrate 1 or 11 for imprint can be maintained, and when a pattern region of a mold 61 is pressed against the resin, the resin is spread to the entire surface of the mold. <P>COPYRIGHT: (C)2012,JPO&INPIT |
